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Beilstein J. Nanotechnol. 2018, 9, 890–899, doi:10.3762/bjnano.9.83
Figure 1: XRR experimental curves and data fitting of the (a) CeO2/TiN and (b) CeO2/Si: as deposited (blue sy...
Figure 2: ToF-SIMS depth profiles of (a) CeO2/TiN as-deposited (RT) and annealed at 400 and 600 °C in N2 and ...
Figure 3: TEM image (cross-sectional view) of CeO2 on TiN annealed at 600 °C.
Figure 4: XPS spectra (both experimental and fitting curves) collected at 45° take-off angle of (a) CeO2/TiN ...
Figure 5: TEM image (cross-sectional view) of CeO2 on Si annealed at 900 °C.
Figure 6: GIXRD profiles of (a) CeO2/TiN and (b) CeO2/Si as-deposited and in situ annealed during acquisition...
Figure 7: Fraction of the crystalline planes oriented in each respective crystalline direction as a function ...
Figure 8: TEM image (plan-view) of CeO2 on Si annealed at 900 °C. Inset: histogram showing the grain size dis...
Figure 9: High-resolution TEM image (plan-view) of CeO2 on Si annealed at 900 °C. The lattice fringes of (111...